Ellipsometry is an optical technique for the contactless and non-destructive determination of dielectric properties of thin films. The physical thickness as well as the refractive index can be probed simultaneously by measuring the change of polarization of light which is reflected at the thin film layer(s) of the sample. By this, information about morphology, composition and other surface properties of the thin layer(s) can be obtained. The samples can be measured in air and also in aqueous conditions, with physical thickness of the layer(s) ranging from tenths of nanometers to several micrometers.
