TMDCs (transition metal dichalcogenides) are an interesting family of 2D semiconducting materials for use as photodetectors, exhibiting exceptional fast response times. In my work I aim to further increase these response times by combining TMDCs with plasmonic structures. Specifically, it is tried to utilize hot electrons, which are forming at the plasmonic structures, to potentially reduce the response times further to a few picoseconds. Additionally, improving the TMDCs absorbance by these plasmonic structures could be achievable. Lithography techniques, including especially electron beam lithography are employed to achieve this goal.